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Home > Archives > Volume 20, No 8 (2022) > Article

DOI: 10.14704/nq.2022.20.8.NQ44239

Optimum Substrate Temperature for SnO2Thin Films Suitable for Photovoltaic Devices

S.Sivathas , S. Murugan , A. Victor Babu, S. Ramalingam, N. Mahendran, D.C. Bernice Victoria


In this work, the investigation is made to study the peculiar properties of SnO2 material thin films using the most popular spray pyrolysis technique with respect to substrate temperature in steps of 100 oC from 300 oC to 600 oC. The structural, morphological, and optical analyses on deposited thin films are carried out to explore the intellectual application of the films. The well-defined crystallinity appears on the crystal at a substrate temperature of 500oC which explicit tetragonal rutile phase structure configuration on the basis of added lattice configuration; it is proved by the observation of the selected diffraction peak. The optical transmittance increase with the improvement of substrate temperature and very high intensity is attained at 500oC. The threshold level of crystal formation begins at 450ºC and the breakdown of the structure happens at 600ºC. In addition, the quantity of light radiation absorbed by the sample surface is high even in the ultraviolet region of the spectrum. The observed frequency shows the consistent formation of the bond structure of Sn-O. The functional bandgap with respect to the temperature is estimated and the wide bandgap is measured at a sample with a temperature of 500ºC.


SnO2 Thin films, Spray pyrolysis, Morphology, Optical Properties

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